发明名称 |
SURFACE INSPECTING APPARATUS AND METHOD FOR SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To improve discrimination accuracy of foreign matters and crystal defects or the foreign matters and scratches existing in the surface of a substrate. SOLUTION: Optical systems 5a and 6a make laser lights irradiate onto the surface of a substrate W and receive scattered lights of the laser lights at different angles to output first and second received light signals D1 and D2. A data processing means 4 set a reference function for defining the correlation between the levels of the first and second received light signals D1 and D2 and compares the levels of the first and second received light signals D1 and D2 using the reference function as a comparison reference. Based on the result of the comparison, it is judged to which a defect existing on the surface of a semiconductor substrate belongs among multiple kinds of different defects.
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申请公布号 |
JP2002098645(A) |
申请公布日期 |
2002.04.05 |
申请号 |
JP20000292676 |
申请日期 |
2000.09.26 |
申请人 |
HITACHI ELECTRONICS ENG CO LTD |
发明人 |
SATO TATSUYA;KATO YUICHIRO;MITOMO KENJI |
分类号 |
G01N21/956;G01N21/95;H01L21/66;(IPC1-7):G01N21/956 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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