| 摘要 |
<p>PURPOSE: A pad conditioning disk is provided to prevent crystals from being removed while pad conditioning process by using an end effector containing enough base material. CONSTITUTION: An end effector(100) is provided for conditioning a polishing pad(102). The end effector(100) comprises a backing plate(106), a matrix material adhered to the first surface of the backing plate, and a plurality of crystals(104) embedded in the matrix material an amount sufficient to prevent the plurality of crystals(104) from becoming dislodged from the matrix material during pad conditioning. The plurality of crystals(104) have an absolute crystal height distribution that is skewed toward zero. Methods are also provided for forming the above-described end effector.</p> |
