FIELD EMISSION FROM BIAS-GROWN DIAMOND THIN FILMS IN A MICROWAVE PLASMA

摘要

A method of producing diamond or diamond like films in which a negative bias is established on a substrate with an electrically conductive surface in a microwave plasma chemical vapor deposition system. The atmosphere that is subjected to microwave energy includes a source of carbon, nitrogen and hydrogen. The negative bias is maintained on the substrate through both the nucleation and growth phase of the film until the film is continuous. Biases between -100V and -200 are preferred. Carbon sources may be one or more of CH4, C2H2 other hydrocarbons and fullerenes.