CARBON-COATING-FILM CLEANING METHOD AND DEVICE

摘要

The present invention provides a method for cleaning a carbon coating film, which can clean the carbon coating film that is formed on each portion of a plasma CVD device, and provides the plasma CVD device. The plasma CVD device 1 includes: first and second sealing members 2a and 2b which are formed of insulators and seal both ends of a workpiece W or a dummy workpiece W′, respectively; an anode 3; decompression units 26 which decompress the inside of the workpiece W or the dummy workpiece W; a source-gas supply unit 6 which supplies a source gas to the inside of the workpiece W; a power source 27; and an oxygen-gas supply unit 8 which supplies oxygen gas to the inside of the dummy workpiece W′.

主权项

1. A method for cleaning a carbon coating film in a plasma CVD device which comprises: first and second sealing members that have bottomed cylindrical shapes, are formed of insulators and seal both ends of a cylindrical electroconductive workpiece, respectively; a decompression unit which decompresses an inside of the workpiece through the first sealing member; a power source which applies a bias voltage to the workpiece; a source-gas supply unit which supplies a source gas containing a hydrocarbon to the inside of the workpiece through the second sealing member; and an anode which is mounted at least in the second sealing member out of the first and second sealing members, the method comprising:
providing an oxygen-gas supply unit which supplies oxygen gas, when the workpiece has been replaced with a cylindrical electroconductive dummy workpiece, to the inside of the dummy workpiece; a step of forming the carbon coating film on an inner surface of the workpiece by sealing both ends of the workpiece with the first and second sealing members, respectively, applying a bias voltage from the power source to the workpiece which is set as a cathode with respect to the anode, while supplying a source gas by the source-gas supply unit to the inside of the workpiece that has been decompressed to a predetermined degree of vacuum by the decompression unit, and thereby generating a plasma of the source gas in the inside of the workpiece; a step of replacing the workpiece having the carbon coating film formed on the inner surface with the cylindrical electroconductive dummy workpiece, and generating an oxygen plasma in the inside of the dummy workpiece, by decompressing the inside of the dummy workpiece to a predetermined degree of vacuum by the decompression unit, and applying a bias voltage from the power source to the dummy workpiece which is set as a cathode with respect to the anode, while supplying oxygen gas to the inside of the dummy workpiece by the oxygen-gas supply unit; and a step of decomposing and removing the carbon coating film which is formed on each portion of the plasma CVD device, by the oxygen plasma.