| 摘要 |
PROBLEM TO BE SOLVED: To provide a sampling vessel for a metal impurity capable of safely and surely sampling a metal impurity without any reduction in hydrolysis efficiency and improving analysis precision. SOLUTION: In this sampling vessel 21 for sampling the metal impurity in semiconductor processing gas, a sample gas introducing tube 24 and a gas discharging tube 25 are arranged in the positions, in which they are not brought into contact with recovery liquid 22, in a sealed vessel 23 storing the recovery liquid 22 hydrolyzing the semiconductor processing gas.
|
