PROJECTION ALIGNER, PROJECTION ALIGNING METHOD, DEVICE- MANUFACTURING METHOD, AND MAINTENANCE METHOD FOR SEMICONDUCTOR MANUFACTURING FACTORY, AND THE PROJECTION ALIGNER

摘要

PROBLEM TO BE SOLVED: To eliminate downtime of a device, caused by the processes of printing to and developing a pilot wafer by minimizing the number of the processes. SOLUTION: A device for projecting and aligning a pattern on the first substrate to the second substrate via a projecting optical system is provided with a detecting optical system for detecting the position of the second substrate via the first substrate and the projecting optical system, a detecting optical system for detecting the position in the direction of the optical axis of the projecting optical system of the first substrate, and means for controlling the focusing position, when the pattern on the first substrate is projected to the second substrate, based on the detection result of both the substrates.