发明名称 |
METHOD OF FORMING WIRING PATTERN |
摘要 |
A method of forming a wiring pattern which includes the steps of: forming a resist pattern having a shrinkage-inhibiting effect on a substrate; releasing gas from the resist pattern by baking the resist pattern; film-forming an electrode material on the substrate and the resist pattern while the temperature of the substrate is kept lower than the baking temperature of the resist pattern; and removing the electrode material on the resist pattern by separating the resist pattern from the substrate.
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申请公布号 |
US2002076660(A1) |
申请公布日期 |
2002.06.20 |
申请号 |
US19990441476 |
申请日期 |
1999.11.17 |
申请人 |
TOYOTA YUJI;KOSHIDO YOSHIHIRO;FUJIBAYASHI KEI;TAKAHASHI RYOICHIRO;OKAWA TADAYUKI |
发明人 |
TOYOTA YUJI;KOSHIDO YOSHIHIRO;FUJIBAYASHI KEI;TAKAHASHI RYOICHIRO;OKAWA TADAYUKI |
分类号 |
H01L21/3205;G03F7/26;H01L21/027;H05K3/04;(IPC1-7):G03F9/00;B05D3/02;B05D3/06;G03F7/004 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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