发明名称 METHOD OF FORMING WIRING PATTERN
摘要 A method of forming a wiring pattern which includes the steps of: forming a resist pattern having a shrinkage-inhibiting effect on a substrate; releasing gas from the resist pattern by baking the resist pattern; film-forming an electrode material on the substrate and the resist pattern while the temperature of the substrate is kept lower than the baking temperature of the resist pattern; and removing the electrode material on the resist pattern by separating the resist pattern from the substrate.
申请公布号 US2002076660(A1) 申请公布日期 2002.06.20
申请号 US19990441476 申请日期 1999.11.17
申请人 TOYOTA YUJI;KOSHIDO YOSHIHIRO;FUJIBAYASHI KEI;TAKAHASHI RYOICHIRO;OKAWA TADAYUKI 发明人 TOYOTA YUJI;KOSHIDO YOSHIHIRO;FUJIBAYASHI KEI;TAKAHASHI RYOICHIRO;OKAWA TADAYUKI
分类号 H01L21/3205;G03F7/26;H01L21/027;H05K3/04;(IPC1-7):G03F9/00;B05D3/02;B05D3/06;G03F7/004 主分类号 H01L21/3205
代理机构 代理人
主权项
地址