发明名称 METHOD AND APPARATUS FOR SIMULATION TESTING ON VAPOR- LIQUID TWO-PHASE LOW
摘要 PROBLEM TO BE SOLVED: To simulate flow phenomenon of a vapor-liquid two-phase flow of high temperature and pressure, under conditions of lower temperature and pressure of flow. SOLUTION: In a testing apparatus 10 for simulating the flow phenomenon of the vapor-liquid two-phase flow where droplets are dispersed in an air flow, a gas of sulfur hexafluoride is used as the air flow and alcohol, sprayed into the gas of sulfur hexafluoride as the droplets.
申请公布号 JP2002189096(A) 申请公布日期 2002.07.05
申请号 JP20000387728 申请日期 2000.12.20
申请人 MITSUBISHI HEAVY IND LTD 发明人 ISHIGURO TATSUO
分类号 G01N21/47;G21C17/00;G21D1/00;(IPC1-7):G21C17/00 主分类号 G01N21/47
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