发明名称 VAPOR DEPOSITION SOURCE AND VAPOR DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a technology for reducing maintenance costs of a coaxial- type arc vapor-deposition source. SOLUTION: The vapor deposition source 5 comprises a vapor deposition material 11 and an porcelain insulator 14. The vapor deposition material 11 can be separated into a main evaporation part 11a which is mainly consumed by evaporation, and a subordinate evaporation part 11b which is consumed a little; and the porcelain insulator 14 can be separated into a flange-shaped porcelain 14b which is mainly consumed, and an inner porcelain cylinder 14a which is consumed a little. Thereby, the cost can be reduced, compared to the conventional method which exchanges the whole evaporation material or the porcelain insulator including the part which is little consumed, on every time of exchanging, when the consumed evaporation material 11 or the porcelain insulator 14, is needed to be replaced, because only the main evaporation part 11a or the flange-shaped porcelain 14b which is mainly consumed, is replaced.
申请公布号 JP2002220655(A) 申请公布日期 2002.08.09
申请号 JP20010017769 申请日期 2001.01.26
申请人 ULVAC JAPAN LTD 发明人 AGAWA YOSHIAKI;OURA HISAMI
分类号 C23C14/24;(IPC1-7):C23C14/24 主分类号 C23C14/24
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