发明名称 HIGH-REFLECTION AND LOW-RESISTANCE THIN FILM AND SPUTTERING TARGET FOR DEPOSITION OF THE SAME
摘要 PROBLEM TO BE SOLVED: To prepare a high-reflection and low-resistance thin film which is useful as a reflection film, reflection electrodes, electrode, wiring, or the like, of a flat panel display(FPD), has high reflectivity, is stable, is low in electric resistance and is, in addition, excellent in film adhesion property and durability as well and a sputtering target usable for deposition of this thin film. SOLUTION: The high-reflection and low-resistance thin film is the film for forming the electrode, wiring, reflection film or reflection electrode of the FPD and is substantially formed of a ternary alloy of Ag-Ru-Au, in which the average reflectivity in a visible light region when the film thickness is 280 nm is >=88%, the difference in the magnitude of the reflectivity is within 10% and the electric resistivity is <=14μΩcm.
申请公布号 JP2002266068(A) 申请公布日期 2002.09.18
申请号 JP20010065613 申请日期 2001.03.08
申请人 KURAMOTO SEISAKUSHO CO LTD;TOYOSHIMA SEISAKUSHO:KK 发明人 TAKAHASHI YUKI;SATAKE HIROMITSU;WATABE NAOSHI;FURUYAMA KOICHI
分类号 G02F1/1343;C22C5/06;C23C14/34;G09F9/30;H01J29/28;(IPC1-7):C23C14/34;G02F1/134 主分类号 G02F1/1343
代理机构 代理人
主权项
地址