| 摘要 |
PROBLEM TO BE SOLVED: To provide a multi-layered thin film resistant to a hydrofluoric acid with a large film thickness and a superb strength which has a surface highly corrosion-resistant to the hydrofluoric acid and effectively assists a failing strength, even when a coated part on the surface is broken down. SOLUTION: This multi-layered thin film resistant to a hydrofluoric acid comprises a laminate formed of a multi-layered Au thin film layer 1a obtained by combining low-resisting conductors made of Au and one kind selected from the group of Cu, Ag, Ni, Pt, and a low-resisting metallic layer 1b using one kind selected from the group of Cu, Ag, Pt, Pd, Ni and Fe, alternately laminated so that the Au thin film layer 1a is arranged on the main surfaces (the face and the back) of the layer 1b. In this laminate, the thickness of the Au thin film layer 1a is limited to the range of 5 to 100 nm and the thickness of the low-resisting metallic layer 1b is limited to the range of 50 nm to a fewμm and the whole film thickness D1 is increased by increasing the number of the Au thin film layers 1a and the low-resisting metallic layers 1b to be laminated.
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