| 摘要 |
PURPOSE: An illumination system cover equipment of semiconductor photolithography equipment is provided to prevent damages of optical members by detecting and limiting a falling state of lighting system cover. CONSTITUTION: A couple of illumination system covers(42a,42b) are separated on the basis of each hinge shaft(44). A plurality of optic members are supported by a plurality of support blocks(40). The illumination system covers(42a,42b) are used for covering the optical members. A cushion portion(50) is located on the support blocks(40). The cushion portion(50) supports the illumination system covers(42a,42b) by using a pressure of gas provided through a connection tube(52) connected with the outside. A limit switch is installed at the cushion portion(50). The limit switch is used for detecting and limiting the falling states of the illumination system covers(42a,42b). A controller receives the detected signal from the limit switch and outputs the detected signal to an output portion.
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