发明名称 EQUIPMENT FOR TREATMENT OF WASTE WATER CONTAINING GALLIUM
摘要 PROBLEM TO BE SOLVED: To provide equipment for the treatment of waste water containing gallium which treats waste water containing gallium discharged from manufacturing factories of compounds semiconductor wafers, manufacturing factories of devices or the like and with which gallium being a rare and valuable metal can be efficiently and completely collected and at the same time, coexistent arsenic can be removed without producing aggregated sludge containing iron. SOLUTION: The equipment for the treatment of waste water containing gallium is equipped with a hydroxide producing means to convert gallium in the waste water containing gallium into hydroxides, with a solid-liquid separating means where the water containing hydroxides is introduced from the hydroxide producing means and separated into the hydroxides and the treated water, and with a gallium adsorbing means in the subsequent stage of the solid liquid separating means so as to adsorb and remove the gallium.
申请公布号 JP2003001268(A) 申请公布日期 2003.01.07
申请号 JP20010185363 申请日期 2001.06.19
申请人 KURITA WATER IND LTD 发明人 MATSUMOTO AKIRA;HAYASHI KAZUKI
分类号 B01D71/02;C01G15/00;C02F1/28;C02F1/44;C02F1/62;(IPC1-7):C02F1/62 主分类号 B01D71/02
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