| 摘要 |
PROBLEM TO BE SOLVED: To always fix the resist release performance by automatically controlling a resist release solution so that the moisture concentration and the degraded component concentration become prescribed values and properly managing solution replenishment of a resist release processing tank, and to reduce the overall manufacturing cost by reducing the use quantity of the resist release solution and shortening the operation halt time. SOLUTION: The aqueous resist release solution management apparatus which manages the aqueous resist release solution used for a resist releasing apparatus in an adjustment tank (1) is provided with a degraded component concentration measuring means (16) which measures the concentration of degraded components derived from the aqueous resist release solution in the adjustment tank (1), solution supply means (24, 25, 26, and 27) which supply at least one of undiluted aqueous resist release solution, a recycled aqueous release solution, pure water and a preliminarily prepared fresh aqueous resist release solution to the adjustment tank, and a solution supply quantity control means (31) which controls the quantity of the solution to be supplied to the adjustment tank on the basis of the measured concentration of degraded components. |
