| 发明名称 |
Method for manufacturing a membrane |
| 摘要 |
A method for manufacturing a membrane in which an n-doped epitaxy layer is applied on a p-doped silicon substrate. Disposed between the silicon substrate and the epitaxy layer is a p-doping which leads to a reduction of the membrane thickness during a subsequent etching process.
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| 申请公布号 |
US6511913(B1) |
申请公布日期 |
2003.01.28 |
| 申请号 |
US20000615142 |
申请日期 |
2000.07.13 |
| 申请人 |
ROBERT BOSCH GMBH |
发明人 |
BENZEL HUBERT;FINKBEINER STEFAN |
| 分类号 |
G01L9/04;B81B3/00;C30B29/06;G01L9/00;H01L29/84;(IPC1-7):H01L21/62 |
主分类号 |
G01L9/04 |
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