METHOD OF MANUFACTURING FINE STRUCTURE, LASER LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING ELECTRO- OPTIC DEVICE AND APPARATUS FOR MANUFACTURING ELECTRO- OPTIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a good fine structure which suppresses the degradation in resolution by focus unsharpness in manufacturing of the fine structure by photolithography. SOLUTION: This method has a process step (S1) of condensing exposure light 112 to a master disk 108 coated with a photosensitive material 111 and subjecting the master disk to scanning exposure while modulating the light quantity thereof and a process step (S2) of forming the three-dimensional pattern shapes of the depth meeting exposure energy by developing the exposed master disk 108. In the exposure process step (S1) described above, the focus of the exposure light is set within the thickness of the photosensitive material 111 applied to the master disk.