发明名称 |
Electro-optic device, drive substrate for electro-optic device and method of manufacturing the same |
摘要 |
An electro-optic device, such as an LCD, includes a display unit and a peripheral drive circuit unit on a single substrate. A gate comprising a gate electrode and gate insulation film is formed on a surface of the substrate. A layer of a substance having good lattice compatibility with manocrystalline silicon is formed over the gate insulation film. A layer of monocrystalline silicon is formed over the substance layer. Manocrystalline silicon is heteroepitaxially grown by catalytic CVD or the like using a crystalline sapphire film formed on the substrate to form the monocrystalline silicon layer. The monocrystalline silican layer is used as a dual gate MOSTFT of the electro-optic device.
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申请公布号 |
US6521525(B2) |
申请公布日期 |
2003.02.18 |
申请号 |
US20010993765 |
申请日期 |
2001.11.27 |
申请人 |
SONY CORPORATION |
发明人 |
YAMANAKA HIDEO;YAMOTO HISAYOSHI;SATOU YUICHI;YAGI HAJIME |
分类号 |
G09F9/30;G02F1/136;G02F1/1362;G02F1/1368;H01J9/02;H01J29/96;H01J31/12;H01L21/20;H01L21/336;H01L27/12;H01L29/786;H01L51/50;H05B33/12;H05B33/26;(IPC1-7):H01L31/119;H01L29/04;H01L31/036 |
主分类号 |
G09F9/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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