| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a device-manufacturing method, and a device that is manufactured by the method. SOLUTION: A control system for a mask table (patterning means) and substrate tables predicts the instantaneous position error in the substrate table, and feeds the position error to a control loop of the mask table for adding to the mask table set point as force to be operated on the mask table.
|
