| 摘要 |
PROBLEM TO BE SOLVED: To provide a normal pressure glow discharge plasma processing device with simple structure used under almost atmospheric pressure which can prevent used gas from diffusion into the surroundings and prevented from mixture of outside air. SOLUTION: The glow discharge plasma processing device processes a base material to be processed by a glow discharge generated by applying electric field between a pair of electrodes of which, at least one electrode is covered by a solid dielectric material and introducing processing gas between electrodes under almost atmospheric pressure. The glow discharge plasma processing device has at least two chambers which are a chamber 1 housing a plasma generation part and the base material to be processed, and a chamber 2 housing the chamber 1. The pressure inside the chamber 2, made lower than atmospheric pressure, is made lower than that of the chamber 1, as a result, it is made so that the processing gas flows out from the chamber 1, and outside air flows into the chamber 2. |
