发明名称 Polymer particles and polishing material containing them
摘要 The polymer particles of the invention are characterized by being obtained by polycondensation of at least one from among Compound 1 represented by general formula (1), its hydrolysates and its partial condensates, and at least one from among Compound 2 represented by general formula (2), its hydrolysates and its partial condensates, and by having a mean particle size of 3-1000 nm.where M is Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ge, Zr, Nb, Mo, Sn, Sb, Ta, W, Pb or Ce; z is the atomic valence of M; R1 and R3 are each an alkyl group of 1-5 carbon atoms, an acyl group of 1-6 carbon atoms or an aryl group of 1-9 carbon atoms; R2 is a monovalent organic group of 1-8 carbon atoms; n is an integer of from 1 to (z-2); and R1, R2 and R3 may be the same or different. These particles are used in polishing compositions used for chemical mechanical polishing.
申请公布号 US6565767(B2) 申请公布日期 2003.05.20
申请号 US20010897129 申请日期 2001.07.03
申请人 JSR CORPORATION 发明人 HATTORI MASAYUKI;MOTONARI MASAYUKI;IIO AKIRA
分类号 C08J5/14;C08G77/02;C08G77/04;C08G77/58;C08G79/00;C08G79/10;C08G79/12;C09G1/02;C09K3/14;(IPC1-7):C09K13/00 主分类号 C08J5/14
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