Device for exposure of a peripheral area

摘要

A device for exposing a peripheral area of a wafer having a photoresist applied thereon is provided in which an irradiation area is prevented from moving in a V-shape in a notch area of the wafer and unnecessary exposure of the wafer is prevented. The device includes an edge determination device, a device for moving the edge determination device, a irradiation moving device and a controller to control the edge determination moving device such that the amount of light received by the light receiving part becomes constant. The controller stops operation of the irradiation moving device when receiving a signal from the edge determination device showing the start of the notch and restarts operation after a given time has passed, or upon receiving a signal indicating the end of the notch.