| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas discharge panel of which, the impure gas content of discharge gas included in the panel is reduced. SOLUTION: The gas discharge panel comprises a film formation chamber 14 having a reactive gas inlet 15 introducing reactive gas during film formation, a supplemental heating chamber 16 heating a base plate held by a base plate holder, arranged between the film formation chamber 14 and a base plate feeding part 11, a cooling chamber for cooling the base plate after filming arranged between the film formation chamber 14 and a base plate take-out part 18, vacuum pumps 27-31 for keeping respective chambers in a prescribed degree of vacuum, and gate valves 21-26 formed between respective chambers. By the above, the quantity of the impure gas, released from a protection film into the discharge gas, is reduced. COPYRIGHT: (C)2003,JPO
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