| 发明名称 |
Negative deep ultraviolet photoresist |
| 摘要 |
The present invention relates to a novel negative working deep uv photoresist that is developable in an aqueous alkaline solution, and comprises a fluorinated polymer, photoactive compound and a crosslinking agent. The photoresist composition is particularly useful for patterning with exposure wavelengths of 193 nm and 157 nm.
|
| 申请公布号 |
US2003129527(A1) |
申请公布日期 |
2003.07.10 |
| 申请号 |
US20020042531 |
申请日期 |
2002.01.09 |
| 申请人 |
KUDO TAKANORI;PADMANABAN MUNIRATHNA;DAMMEL RALPH R.;TOUKY MEDHAT A. |
发明人 |
KUDO TAKANORI;PADMANABAN MUNIRATHNA;DAMMEL RALPH R.;TOUKY MEDHAT A. |
| 分类号 |
C08F32/08;G03F7/004;G03F7/033;G03F7/038;G03F7/38;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
C08F32/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
