发明名称 METHOD OF MANUFACTURING INKJET RECORDING HEAD
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing an inkjet recording head capable of improving the manufacturing efficiency and suppressing the cost. SOLUTION: This method comprises a process for forming a diaphragm 50 and a piezoelectric element 300 on one face of a silicon wafer 100 to be a fluid passage forming substrate 10, a process wherein a sealing substrate forming material 120 to be a sealing substrate 30 having a piezoelectric element holding section 31 for forming the piezoelectric element 300 is bonded to the face of the silicon wafer 100 at the side of the piezoelectric element 300 to form a bonded body 130 having a step section 130a formed thereon at the periphery of the silicon wafer 100, a process wherein the bonded body 130 is covered by a protection film 140 and the periphery of the protection film 140 is pressed against the step section 130a to be fixed thereto to detachably seal the protection film 140, a process for forming a pressurizing chamber 12 by applying anisotropic etching to the silicon wafer 100 from the other face, and a process for dividing the silicon wafer 100 and the sealing substrate forming material 120 in predetermined sizes. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003205616(A) 申请公布日期 2003.07.22
申请号 JP20020007496 申请日期 2002.01.16
申请人 SEIKO EPSON CORP 发明人 TAKAHASHI TETSUJI
分类号 B41J2/16;B41J2/045;B41J2/055;(IPC1-7):B41J2/16 主分类号 B41J2/16
代理机构 代理人
主权项
地址