| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam equipment and an image forming system which are equipped with superior visual quality being able to correct beam gap and which have a spacer with proper yield, without forming a spacer electrode by a new process. SOLUTION: The spacer 1020 composes that irregularity is formed on an exposure surface standing between an electron source and an electron beam irradiated member and that an antistatic film 11 is covered on this irregularity, connects with the electron source and is provided with a site which is flatter than the irregularity in areas near the electron source or the electron beam irradiated member. This antistatic film 11 comprises that its sheet resistance value of a part of a irregular shape, having a predetermined angle with respect to a normal line which is vertical to a parallel face with the electron source, is set higher than that of the other parts. COPYRIGHT: (C)2003,JPO
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