| 摘要 |
A method of manufacturing an electronic device that includes the step of forming a pattern on a substrate by using a halftone phase shift mask where the halftone phase shift mask includes a translucent phase shift pattern having an aperture; and an auxiliary pattern, disposed near the aperture and having as a principal component an organic film which possesses a light attenuating property or a light shielding property against exposure light. The halftone phase shift mask fabricating Turn-Around-Time (TAT) is shortened thereby shortening the development time required for an electronic device, the production cost of which has also been reduced. |
