| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for resist development for detecting the end point of development of a resist such that the most optimum optical performance as an optical element, etc., can be obtained when the resist applied onto a substrate is developed. SOLUTION: This resist developing apparatus irradiates the resist with light from a light source 11 while the resist 1a applied onto the base material 1 is immersed into a developing solution 21a for developing the resist 1a, converges reflected light from the surface of the resist or light transmitted through the resist and substrate and detects the convergence state of the reflected light or transmitted light by using a development detection unit 10, and determines the optimum development state for forming a microstructure on the base material according to the detected light convergence state. COPYRIGHT: (C)2004,JPO |
