发明名称 |
METHOD FOR FORMING GOLD THIN FILM ONTO SILICON PRISM SURFACE FOR SURFACE REINFORCING INFRARED DISPERSION |
摘要 |
PROBLEM TO BE SOLVED: To provide a new method for forming a gold thin film on a silicon prism surface for surface reinforcing infrared dispersion, and obtaining the degree of reinforcement of 50 times or more in adsorption kinds and solution kinds by improving the adhesion of the gold thin film and a silicon prism. SOLUTION: The silicon prism surface for the surface reinforcing infrared dispersion is treated with hydrofluoric acid, and next, a discontinuous and smooth gold silicide very thin film (thickness does not exceed a few atom layers) is made by oxidizing and dissolving a part thereof with aqua regia. The discontinuous and smooth gold film is formed on the silicon prism surface by depositing a gold thin film (approximately 30 nm thick) thereon. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003344618(A) |
申请公布日期 |
2003.12.03 |
申请号 |
JP20020154276 |
申请日期 |
2002.05.28 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
FUTAMATA MASAYUKI;NIKOLAI GUUTEFU |
分类号 |
G02B5/08;C23C14/02;C23C14/14;G02B5/26;(IPC1-7):G02B5/08 |
主分类号 |
G02B5/08 |
代理机构 |
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