发明名称 SCANNING ALIGNER, SCANNING EXPOSURE METHOD, METHOD FOR MANUFACTURING DEVICE, AND DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a scanning aligner for easily reproducing a high resolution and a projection image on a large screen for a mask deformed by its own weight in the scanning aligner for projecting mask patterns to a substrate, and to provide a method for manufacturing a device using the aligner. <P>SOLUTION: The scanning aligner, comprising an arc illumination optical system 7, a projection optical system 4 for projecting a pattern within a mask 1 illuminated by the illumination optical system to the substrate 5, a mask stage 2 for scanning the mask, and a substrate stage 6 for making the substrate scan, scans the mask stage and the substrate stage in synchronizing each other. To position the mask pattern image and the substrate to a predetermined positional relation, the scanning aligner has a mask supporting means for supporting a peripheral part of the mask, and a mask stage inclination means for setting the pattern within the illumination region of the mask deformed by its own weight resulted from the peripheral support within a focal surface of the body surface side of the projection optical system. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004039697(A) 申请公布日期 2004.02.05
申请号 JP20020191329 申请日期 2002.06.28
申请人 CANON INC 发明人 KODA TORU;TSUTSUI SHINJI
分类号 G02F1/13;G03F1/44;G03F7/20;G03F7/207;G03F9/00;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G02F1/13
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