发明名称 SYSTEM FOR AND METHOD OF AUTOMATICALLY INSPECTING SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of automatically inspecting an X-ray mask or an equivalent electrically conductive substrate using charged particles at low cost. <P>SOLUTION: By measuring the position of the substrate, a charged-particle beam is accurately positioned on the substrate. The charged-particle beam is deflected to a desired position of the measured substrate. The desired position of the surface of the substrate is scanned with the charged-particle beam. As a result, at least one type of charged particles are detected among secondary charged particles generated from the top surface and the bottom surface of the substrate, back scattered charged particles, and transmitted charged particles. The substrate is automatically inspected using charged particles according to the steps. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004061504(A) 申请公布日期 2004.02.26
申请号 JP20030193131 申请日期 2003.07.07
申请人 KLA INSTR CORP 发明人 MEISBURGER DAN;BRODIE ALAN D;CHADWICK CURT;DESAI ANIL;DOHSE HANS;EMGE DENNIS;GREEN JOHN;JOHNSON RALPH;KIRK CHRIS;LING MING-YIE;MCMURTRY JOHN;BECKER BERRY;JOHN GIBIRISUKO;PAUL RAY;ROBINSON MIKE;PAUL SANDLAND;SIMMONS RICHARD;SMITH DAVID E A;TAYLOR JOHN;VENEKLASEN LEE;WALTERS DEAN;WIECZOREK PAUL;WONG SAM;DUTTA APRIL;LELE SURENDRA;ROUGH KIRKWOOD;PEARCE-PERCY HENRY;JAU JACK Y;JESSIE LYNNE;NGUYEN HOI ZA;OYANG YEN-JEN;HUTCHESON TIMOTHY L
分类号 G01B15/00;G01B15/08;G01N23/04;G01N23/203;G01N23/225;G01R31/307;G03F1/08;G03F1/16;H01J37/147;H01J37/20;H01J37/22;H01J37/244;H01J37/28;H01L21/027;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01B15/00
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