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发明名称
投影光学系统,微影方法,曝光装置及使用此曝光装置的方法
摘要
一种在宽广视野上以高解析度投影成像(image)之微影浸没投影系统(lithographicimmersionprojectionsystem)与方法。上述投影系统与方法包括一个在光进入浸没液体并撞击成像平面之前减少光径之边缘光线角度之最终透镜。
申请公布号
TW200403547
申请公布日期
2004.03.01
申请号
TW092123099
申请日期
2003.08.22
申请人
尼康股份有限公司
发明人
大村泰弘;池泽弘范;大卫M 威廉森
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
詹铭文;萧锡清
主权项
地址
日本
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