发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To make fine a MOSFET for high frequency amplification having a drain offsetting region fine and, at the same time, lower its on-resistance. <P>SOLUTION: In the MOSFET, electrode leading-out conductor plugs 13(p1) are respectively provided on a source region 10, a drain region 9, and a reach-through layer 3 (4). Two layers of first-layer wiring 11s and 11d(M1) are respectively connected to the conductor plugs 13(p1), and two layers of second-layer wiring 12s and 12d for back lining are respectively connected to the first-layer wiring 11s and 11d(M1) on the plugs 13(p1). <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004096118(A) 申请公布日期 2004.03.25
申请号 JP20030320603 申请日期 2003.09.12
申请人 HITACHI LTD 发明人 HOSHINO YUTAKA;IKEDA SHUJI;YOSHIDA ISAO;KANBARA SHIRO;KAWAKAMI MEGUMI;MIYAKE TOMOYUKI;MORIKAWA MASATOSHI
分类号 H01L21/768;H01L21/822;H01L21/8234;H01L27/04;H01L27/088;H01L29/417;H01L29/78;(IPC1-7):H01L29/78;H01L21/823 主分类号 H01L21/768
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