发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which further improves voltage withstanding.SOLUTION: A semiconductor device of an embodiment comprises: a first semiconductor region; second semiconductor regions selectively provided on a surface of the first semiconductor region; third semiconductor regions selectively provided on surfaces of the second semiconductor regions; a first electrode which is electrically connected to the third semiconductor region and includes a contact region which extends from a surface of the third semiconductor region to the second semiconductor region and has a bottom edge located on the underside of the third semiconductor region, and which has a width at the bottom edge narrower than a width at a position of the surface of the third semiconductor region; a fourth semiconductor region provided between the contact region, and the second semiconductor region and the third semiconductor region; a second electrode electrically connected to the first semiconductor region; and a third electrode provided on the first semiconductor region, the second semiconductor region and the third semiconductor region via an insulation film.SELECTED DRAWING: Figure 1
申请公布号 JP2016171176(A) 申请公布日期 2016.09.23
申请号 JP20150049341 申请日期 2015.03.12
申请人 TOSHIBA CORP 发明人 UEHARA JUNICHI;KONO HIROSHI;FURUKAWA MASARU
分类号 H01L29/78;H01L21/336;H01L29/06;H01L29/12 主分类号 H01L29/78
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