INSPECTION METHOD AND DEVICE MANUFACTURING METHOD USING IN-LINE TECHNIQUE WHICH DETECTS AND CALCULATES ERROR IN LITHOGRAPHIC APPARATUS

摘要

PURPOSE: An inspection method and a device manufacturing method are provided to perform inspection by using an in-line technique which detects and calculates an error in a lithographic apparatus. CONSTITUTION: A test pattern has more than one degree of symmetry and is sensitive to more than one aberration which can happen in a lithographic apparatus. The test pattern is printed on a substrate by using the lithographic apparatus. A reflection spectrum of the test pattern is detected by using a scatterometry. Information which is indicative of an amount of at least one type of aberration of the lithographic apparatus is read from the reflection spectrum. The test pattern is sensitive to the at least one type of aberration. The test pattern includes a two-bar grating. The bar grating has an inner duty ratio and an outer duty ratio which is different from the inner duty ratio.