| 发明名称 |
DEPOSITION PATTERN RESTORATION DEVICE, DEPOSITION PATTERN RESTORATION METHOD, AND MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE |
| 摘要 |
PROBLEM TO BE SOLVED: To surely restore a defective part by preventing the sticking of dust. SOLUTION: A deposition pattern restoration device is provided with a removal means 107 for irradiating the deposition pattern of a top layer among the respective deposition patterns formed in layers on a substrate 83 with ion beams and removing at least a part of the deposition pattern of the top layer. COPYRIGHT: (C)2004,JPO&NCIPI |
| 申请公布号 |
JP2004253631(A) |
申请公布日期 |
2004.09.09 |
| 申请号 |
JP20030042664 |
申请日期 |
2003.02.20 |
| 申请人 |
SEIKO EPSON CORP |
发明人 |
YOKOGAWA MAGOYUKI;TOSHIMA KIYOFUSA |
| 分类号 |
G02F1/1368;G02F1/1343;H01L21/302;H01L21/66;H01L29/786;(IPC1-7):H01L21/302;G02F1/136 |
主分类号 |
G02F1/1368 |
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