| 摘要 |
A method to form a waveguide taper includes forming a core layer on a cladding layer. A protective layer with an opening is formed on the core layer, the opening exposing a portion of the core layer. A CMP process is performed so that dishing occurs in the exposed portion, forming a depression with a sloped sidewall. In one embodiment, the core layer is then patterned so that a portion of the core layer is removed to about the depth of the depression. This removed portion includes a part of the core layer containing the depression. The resulting structure includes an unetched sloped surface that transitions to a substantially planar etched surface. The core layer is patterned and etched again to form the waveguide, with the sloped surface forming part of the taper.
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