| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an exhaust gas treatment apparatus which has a high decomposition rate of a perfluoro compound (PFC) even when the exhaust gas to be treated contains nitrogen, in which the production amount of NOx is made small and which can be used under atmospheric pressure. <P>SOLUTION: This exhaust gas treatment apparatus is used for treating the exhaust gas consisting of PFC gas and nitrogen gas to decompose the PFC in the exhaust gas. This apparatus has a gaseous additive supplying unit for supplying a gaseous additive such as hydrocarbon, hydrogen and ammonia having a hydrogen atom to the exhaust gas to be treated and a plasma chamber for plasma-treating the exhaust gas containing the gaseous additive. This apparatus can be constituted so that the gaseous additive supplying unit is arranged on the downstream side of the plasma chamber to supply the gaseous additive to the plasma-treated exhaust gas. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
