发明名称 LAYOUT FOR THERMALLY SELECTED CROSS-POINT MRAM CELL
摘要 A resistive memory device (40) and method of manufacturing thereof including magnetic memory cells (14) having a second magnetic layer (20) including at least a first and second material (24/26). The Curie temperature of the second material (26) is lower than the Curie temperature of the first material (24). A plurality of non-continuous second conductive lines (22) are disposed over the magnetic memory cells (14). A current (28) may be run through the second conductive lines (22) to increase the temperature of the second material (26) to a temperature greater than the second material (26) Curie temperature, causing the second material (26) to lose its ferromagnetic properties, providing increased write selectivity to the memory array (40).
申请公布号 KR20050007382(A) 申请公布日期 2005.01.17
申请号 KR20047017720 申请日期 2003.04.01
申请人 发明人
分类号 H01L21/8247;H01L27/105;G11C11/15;G11C11/16;H01L21/28;H01L21/8246;H01L27/115;H01L27/22;H01L43/08 主分类号 H01L21/8247
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