CHARGED PARTICLE BEAM PROJECTING EXPOSURE DEVICE, MASK FOR EXPOSURE, METHOD OF MANUFACTURING MASK FOR EXPOSURE, AND CHARGED PARTICLE BEAM PROJECTING EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam projecting exposure device that uses a mask and can suppress the expansion of a charged particle beam caused by the repulsion of charged particles to each other due to a Coulomb force by improving the mechanical strength of a stencil mask, and at the same time, reducing the number of openings of the mask.

SOLUTION: The charged particle beam projecting exposure device 100 and the stencil mask 6 manufactured by narrowing a mask pattern used for exposure are used. When the exposure device 100 performs exposure by using the stencil mask 6, the line width of a pattern transferred to the wafer 9 is thickened by moving an electronic beam 2 with respect to a wafer 9 by changing the electron optics-based condition of the electron beam 2 and the position of the stencil mask 6 or the wafer 9. Consequently, the opening area of the stencil mask 6 can be reduced.

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