| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To properly control the closely attached state of a mask by detecting the strain of a mask membrane in a proximity-field exposure conducting an exposure by closely attaching the mask on a substrate. <P>SOLUTION: The mask 1 used for the proximity-field exposure has an exposure pattern 14 at the central section of the mask membrane 10 in which an outer edge is supported to a mask supporter 12. A strain gage 15 for detecting the deformation of the mask membrane 10 is attached to a peripheral section surrounding an exposure pattern 14. The mask 1 is opposed to the substrate, the deformation of the mask membrane 10 is monitored by the strain gage 15, and the difference of an atmospheric pressure is adjusted in a process in which the substrate is stuck fast to a resist by pressing the mask membrane 10 by the difference of the atmospheric pressure and the substrate is controlled under the proper fast stuck state. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
