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发明名称
METHOD FOR INSPECTING A PROCESSING MARGIN IN A PHOTOLITHOGRAPHY PROCESSING
摘要
申请公布号
KR20050035362(A)
申请公布日期
2005.04.18
申请号
KR20030070932
申请日期
2003.10.13
申请人
HYNIX SEMICONDUCTOR INC.
发明人
CHOI, JOONG IL
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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