| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To stabilize a temperature on a substrate surface in response to even a difference in heat generation amount at each substrate in an electron source manufacturing process, improve an electron emission property and performance such as a service life of an electron source and also reduce variations in performance of each substrate. <P>SOLUTION: A manufacturing apparatus of an electron source has a support body 207 on which a substrate 10 with a plurality of conductive members 4 disposed thereon is laid, a pulse generation unit 216 applying voltages to the members 4, temperature regulating means 102, 103 controlling the temperature of the support body 207, and a measurement means 101 measuring the heat generation amount from the substrate 10. The regulating means 102, 103 control the temperature of the support body 207 on the basis of the heat generation amount measured by the measurement means 101. The measurement means 101 also measures the heat generation amount on the basis of the voltages to be applied to the members 4 and currents made to flow in the members 4. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
