Epoxy compound having alicyclic structure, polymer, resist composition and patterning process

摘要

Epoxy compounds of formula (1) are provided wherein W is CH₂, O or S, X and Y are -CR¹R²- or -C(-O)-, k is 0 or 1, R¹ and R² are H or alkyl, or R¹ and R², taken together, may form an aliphatic hydrocarbon ring with the carbon atom to which they are connected. A resist composition comprising a polymer having recurring units of the epoxy compound as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.