发明名称 |
USE OF A TOP LAYER ON A MIRROR FOR USE IN A LITHOGRAPHIC APPARATUS, MIRROR FOR USE IN A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS COMPRISING SUCH A MIRROR AND DEVICE MANUFACTURING METHOD |
摘要 |
A lithographic apparatus has a source (SO), an illumination system with a mirror, a support structure for patterning means, a substrate table and a projection system. The source (SO) is arranged to provide radiation of a desired wavelength, e.g., EUV. It generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The lithographic apparatus further has a heat source (38) to heat the mirror. Consequently, the surface mobility of the metal particles on the mirror is increased.
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申请公布号 |
SG111237(A1) |
申请公布日期 |
2005.05.30 |
申请号 |
SG20040006153 |
申请日期 |
2004.10.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BAKKER, LEVINUS PIETER;SCHUURMANS, FRANK JEROEN PIETER |
分类号 |
G02B1/00;G02B1/10;G02B5/08;G03F1/14;G03F1/24;G03F7/20;G21K1/06;G21K5/00;H01L21/00;H01L21/027 |
主分类号 |
G02B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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