TRANSPORTATION SYSTEM AND TRANSPORTATION METHOD

摘要

PROBLEM TO BE SOLVED: To realize an electron beam proximity exposure apparatus which is low in cost and is high in a throughput.

SOLUTION: The electron beam proximity exposure apparatus includes vacuum chamber 1 which contains a stage 5 that moves keeping a wafer 4 and an electron optical column 2 that irradiates an electron beam to a mask 3 to expose an exposure pattern in a state where the mask 3 having an opening pattern corresponding to the exposure pattern is located close to the wafer 4 held on the stage 5, a load lock mechanism 31 which takes the wafer under an atmospheric pressure into the vacuum chamber 1 and returns the wafer under an atmospheric pressure, and a mask opener 51 which takes the mask 3 stored in a mask container 60 into the vacuum chamber 1 and returns it to the mask container 60. The electron beam approaching exposure apparatus also is equipped with a transfer mechanism 11 which transfers the wafer 4 between the stage 5 and the load lock mechanism 31 and transfers the mask 3 between the stage 5 and the mask opener 51.

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