发明名称 APPARATUS FOR SCAN TYPE EXPOSURE USING FILM MASK
摘要 <p>An exposure apparatus includes a glass moving in a predetermined direction on a stage, a roll-film mask positioned above the glass and having a transfer pattern therein, and an exposure system for radiating ultraviolet light on an upper surface of the film mask so that the transfer patter formed in the film mask is transferred on the glass.</p>
申请公布号 KR20050078538(A) 申请公布日期 2005.08.05
申请号 KR20040006705 申请日期 2004.02.02
申请人 LG ELECTRONICS INC. 发明人 KIM, SANG JIN
分类号 G03F7/20;G03B27/42;G03C5/00;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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