发明名称 REVERSE CONDUCTING IGBT
摘要 A reverse conducting IGBT is provided with a trench gate member that is provided in an IGBT region and has a lattice-pattern layout, and a trench member that is provided in a diode region and has a stripe-pattern layout. The diode region of the semiconductor substrate includes an anode region of a first conductive type, a drift region of a second conductive type and a barrier region of the second conductive type. The barrier region is electrically connected to a top surface electrode via a pillar member that extends from a top surface of the semiconductor substrate.
申请公布号 US2016351561(A1) 申请公布日期 2016.12.01
申请号 US201615095458 申请日期 2016.04.11
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 SENOO Masaru
分类号 H01L27/06;H01L29/739;H01L29/06;H01L29/872 主分类号 H01L27/06
代理机构 代理人
主权项 1. A reverse conducting IGBT comprising: a semiconductor substrate partitioned into an IGBT region in which an IGBT structure is provided and a diode region in which a diode structure is provided; a bottom surface electrode in contact with a bottom surface of the semiconductor substrate, the bottom surface electrode being in contact with both the IGBT region and the diode region of the semiconductor substrate; a top surface electrode in contact with a top surface of the semiconductor substrate, the top surface electrode being in contact with both the IGBT region and the diode region of the semiconductor substrate; a trench gate member provided in the IGBT region of the semiconductor substrate, having a lattice-pattern layout when seen from a direction orthogonal to the top surface of the semiconductor substrate; and a trench member provided in the diode region of the semiconductor substrate, having a stripe-pattern layout when seen from the direction orthogonal to the top surface of the semiconductor substrate, wherein the trench member comprises a plurality of stripe trenches extending along a first direction, the diode region of the semiconductor substrate comprises: an anode region of a first conductive type that is provided between adjacent stripe trenches, is exposed at the top surface of the semiconductor substrate, and is in contact with the top surface electrode;a drill region of a second conductive type that is provided beneath the anode region;a barrier region of the second conductive type that is provided between adjacent stripe trenches, is provided between the anode region and the drift region, has an impurity concentration which is higher than an impurity concentration of the drift region, and is electrically connected to the top surface electrode via a pillar member that extends from the top surface of the semiconductor substrate.
地址 Toyota-shi JP