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发明名称
用于图形化线宽不等的线之复合光学微影法
摘要
复合图形化技术包含二微影制程。第一微影制程使用干涉微影术以在光阻上形成具有实质等宽的线及空间之干涉图形。第二微影制程使用例如光学微影术、压印微影术、及电子束微影术等一或更多非干涉微影技术,以中断图形化线的连续性及形成所需的积体电路特征。
申请公布号
TW200527147
申请公布日期
2005.08.16
申请号
TW093131837
申请日期
2004.10.20
申请人
英特尔股份有限公司
发明人
颜 柏拉多司凯
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
林志刚
主权项
地址
美国
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