| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a correcting apparatus for an optical member to correct an original plate for exposure having a light-transmitting optical member on a photomask, and to provide an apparatus and a method for correcting an optical member such as a pellicle film to eliminate the uneven film thickness of the optical member such as a pellicle or stress distortion caused on sticking the optical member such as a pellicle film. <P>SOLUTION: The correcting apparatus for an optical member is equipped with a measuring means to measure the amount of optical distortion in an optical member, a laser irradiating means to change the refractive index of the optical member, and a stage moving means which mounts an original plate for exposure having the optical member and which can move to any position in the plane direction of the original plate for exposure and in the film thickness direction of the optical member. After the optical member is mounted on the photomask, the correcting means condenses laser light into within the film of the optical member and irradiates the member with the laser light. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
