| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a metal mold (stamper) and a molding from breaking by reducing the load, when the molding is released from the metal mold (stamper). <P>SOLUTION: A mask 21, which has a pattern formed of unevenness for a prescribed antireflection function at an effective region part and is varied outwardly in the volume ratio of the uneven pattern, is provided on a substrate 1 and is used to form a pattern of an antireflection structure, which gradually increases in the depth of the unevenness of the antireflection function from the outer circumference to the inner periphery and has prescribed-depth and prescribed-shape unevenness formed in the effective region, on the substrate by etching; and a metal 3 for the metal mold is bonded to the substrate 1 where the antireflection film pattern is formed to transfer the antireflection film pattern to the metal for the metal mold, and then the substrate 1 and the metal 3 for metal mold are separated to form the metal mold. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
